Microwave Technology

With microwave PACVD technology, the gases and precursors are activated with microwave frequencies to generate the plasma, not with pulsed bias. Without the need for a bias voltage, non-conductive coatings and coatings on non-conductive materials become possible. In addition, the remote microwave plasma generator means the product load has less influence on the deposition process, leaving more process

parameters, such as bias voltage, available to tune the coating characteristics.

Remote plasma generator, so coating properties depend less on the product load in the chamber

Enables coatings such as DLC on non-conductive products such as plastic or glass

Can be used with a wider range of precursor gases (such as C2H2, HMDSO and O2) to make coatings such as SiO2

Improved process repeatability (for DLC) for a mixed load of products that is typical for jobcoaters.

Uniform plasma distribution over the height of the system

Bias voltage available to tune coating properties

Microwave technology opens a window for new etching and activation processes