PACVD is the abbreviation of plasma assisted chemical vapor deposition. Sometimes it is also written as PECVD. E stands for enhancement. In the PVD process, the coating material is obtained by evaporation from the solid form; in the PACVD process, the coating is obtained from the gas form, and the gas, such as hmdso (hexamethyldimethylsiloxane), under the action of plasma, is about 200% Non reactive gases, such as argon, can cause ions to deposit on the workpiece surface and form a very thin coating.