Equipment
- ALD system
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- Energy
Application
- Solar
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Technology
- ALD
- PVD
- CVD
- PECVD
Information
- HCVAC Listing
- Exhibition
- How to operate the equipment
Applications
Electrode formation / multilayer and co-deposition of electrodes
Dielectric, insulating, passivation, and protective films
R&D and small-scale production of electronic components
Suitable for elemental films of Ti, Cu, Al, Cr, Ni, Ag, Sn, widely used in semiconductor devices
Widely applied in electronic device R&D and production, it allows metal or resistive film deposition on ceramics, glass, and metals. Capable of full-coverage plating for through-vias, with TGV aspect ratios up to 15:1 and TCV vias of 20 µm diameter at aspect ratios up to 20:1.
Adopts a load-lock sputtering system with modular options for RF, DC, HiPIMS high-power pulsed magnetron sputtering, and pulsed bias. The transfer chamber supports up to five substrate carriers with automatic lifting and handling, improving throughput. Multiple cathodes can operate simultaneously for multilayer deposition. The system enables automated process control and comprehensive data logging.
Key Features of TGV / TCV Sputtering System
Tailored TGV solutions for your advanced packaging needs
Designed for conductive vias, insulating layers, and seed layers in advanced packaging
High productivity at low cost
Supports smaller sizes and more multi-layer designs to accelerate technology upgrades
Reliable heating control system
Mature magnetron sputtering technology
| Specifications | |
| Cathode | Planar Magnetron Cathode / Rotatable Cylindrical Cathode |
| Power Supply | DC / DC-pulse / MF / RF |
| Tray Size | L400*W450 (customization) |
| Pumping System | Loading / Unloading Chamber: Roughing Pump + Molecular Pump Process Chamber: Molecular Pump / Cryopump |
| Heating System | Max 400℃ |
| Performances | |
| Uniformity | ±1.2% |
| Pressure Maintaining | ＜0.1Pa |
| PVD Copper Thickness | Max.10um |
| Ultimate Pressure | 3.0 * 10-5 Pa |
| Pumping Down Time | within 3min until 2.0 * 10-2 Pa |
Looking for a solution tailored to your needs? Our team is ready to provide you with expert guidance and support.
