---Good film density
It is widely used for coating watchbands, watchcases, mobile phone cases, hardware, tableware, and more. It can deposit a wide range of decorative coatings such as TiN, TiC, TiCN, TiAlN, and CrN.
The machine is capable of producing coatings in various metallic colors, including steel, nickel, gold, bronze, anthracite, and black. The coating color is determined by its composition, which may include zirconium, titanium, nitrogen, carbon, oxygen, and other metals. Our process engineering team can fine-tune the color to meet your specific requirements—helping your products stand out in the market.
Key Features of HCMS Series Magnetron Sputtering Equipment
Fast deposition rates for improved productivity
Small footprint, easy to integrate into the factory
Accurate control over film thickness for consistent results
Achieves high-purity coatings with excellent density and uniformity
Widely used for coating metals, alloys, and oxides
Enables remote diagnostics and technical assistance for smooth operation
MF sputtering technique has become the mainstream technology of magnetron sputtering. Its advantages over DC sputtering are as follows:
It overcomes the phenomenon of anode disappearance, reduces or eliminates abnormal arc discharge on the target, thereby improving the stability of the sputtering process and increasing the deposition rate of dielectric coatings.
We have also developed planar targets, cylindrical targets, twin targets, opposite targets, and various other MF sputtering target structures.
Mode | HCMS-1212 |
Size | Ф1200×H1200mm |
Coating | Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc |
Power supply | DC magnetron sputtering power supply,MF sputtering power supply,high pressure ion bombard power supply |
Target | DC magnetic control target, medium frequency twin target, plane target and cylindrical target |
Structure | Vertical signal door, vertical double doors |
Pump system | Molecule pump(diffusion pump)+Roots pump +Mechanical pump+Holding pump(optional: turbo pump,poly cold system) |
Air system | Mass flow controller(1-4road) |
Ultimate vacuum | 6×10-4pa(no-loading,clean chamber) |
Pumping time | No-loading from air to 5×10-3pa <13mins |
Workpiece motion mode | 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation |
Control mode | Manual+semi-automatic+Automatic integration/touch screen+PLC |
Remark | We can design the dimension of the equipment according to customers special technique requirement. |
Mode | HCMS-1612 |
Size | Ф1600×H1200mm |
Coating | Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc |
Power supply | DC magnetron sputtering power supply,MF sputtering power supply,high pressure ion bombard power supply |
Target | DC magnetic control target, medium frequency twin target, plane target and cylindrical target |
Structure | Vertical signal door, vertical double doors |
Pump system | Molecule pump(diffusion pump)+Roots pump +Mechanical pump+Holding pump(optional: turbo pump,poly cold system) |
Air system | Mass flow controller(1-4road) |
Ultimate vacuum | 6×10-4pa(no-loading,clean chamber) |
Pumping time | No-loading from air to 5×10-3pa <13mins |
Workpiece motion mode | 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation |
Control mode | Manual+semi-automatic+Automatic integration/touch screen+PLC |
Remark | We can design the dimension of the equipment according to customers special technique requirement. |
Mode | HCMS-1912 |
Size | Ф1900×H1200mm |
Coating | Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc |
Power supply | DC magnetron sputtering power supply,MF sputtering power supply,high pressure ion bombard power supply |
Target | DC magnetic control target, medium frequency twin target, plane target and cylindrical target |
Structure | Vertical signal door, vertical double doors |
Pump system | Molecule pump(diffusion pump)+Roots pump +Mechanical pump+Holding pump(optional: turbo pump,poly cold system) |
Air system | Mass flow controller(1-4road) |
Ultimate vacuum | 6×10-4pa(no-loading,clean chamber) |
Pumping time | No-loading from air to 5×10-3pa <13mins |
Workpiece motion mode | 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation |
Control mode | Manual+semi-automatic+Automatic integration/touch screen+PLC |
Remark | We can design the dimension of the equipment according to customers special technique requirement. |
Mode | HCMS-2121 |
Size | Ф2100×H2100mm |
Coating | Multi-function metal coating,composite membrane, transparent conductive coating, increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc |
Power supply | DC magnetron sputtering power supply,MF sputtering power supply,high pressure ion bombard power supply |
Target | DC magnetic control target, medium frequency twin target, plane target and cylindrical target |
Structure | Vertical signal door, vertical double doors |
Pump system | Molecule pump(diffusion pump)+Roots pump +Mechanical pump+Holding pump(optional: turbo pump,poly cold system) |
Air system | Mass flow controller(1-4road) |
Ultimate vacuum | 6×10-4pa(no-loading,clean chamber) |
Pumping time | No-loading from air to 5×10-3pa <13mins |
Workpiece motion mode | 6 axis / 8axis/9axis public and self rotation/frequency conversion stepless speed regulation |
Control mode | Manual+semi-automatic+Automatic integration/touch screen+PLC |
Remark | We can design the dimension of the equipment according to customers special technique requirement. |
Looking for a solution tailored to your needs? Our team is ready to provide you with expert guidance and support.