High Precision Multi Cavity Magnetron Sputtering Optical Coating Machine

Compared with the ordinary plane target device in the industry, the service cycle and utilization efficiency of the target material of the rotary cathode device are significantly improved; the customized structure of the base plate work-piece rack can provide customers with the maximum utilization space for their products; the fully automatic lifting and lifting rotary rack device can greatly reduce the opening and closing time of the machine and greatly improve the production efficiency and process stability; Huicheng patent is issued The sub source has the characteristics of wide working range, energy balance, high ionization rate, super stable working efficiency and low energy consumption.

It can precisely control the film thickness by time to meet the design process requirements, save crystal control and optical control links, and save a lot of consumables for film thickness meter; it can produce high refractive index nitrided film to improve the hardness performance of film; it can form film at low temperature to cope with various uses; it can automatically adjust the gas flow patent device to maintain stable target voltage to ensure the film quality; it can also select "correction plate" External adjustment mechanism